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Programmable Planetary Etching Mechanism

IP.com Disclosure Number: IPCOM000042791D
Original Publication Date: 1984-Jun-01
Included in the Prior Art Database: 2005-Feb-04

Publishing Venue

IBM

Related People

Authors:
Knappenberger, JR Levine, JE MacKinnon, DA [+details]

Abstract

This mechanism controls etch uniformity across large surface areas for two-sided etching of metal substrates. Referring to Fig. 1, the samples to be etched are held in an etch wheel assembly 1, which has individual gear-driven planetary, eccentric mask holders 5 holding sample foil 6. The gear-driven holders are rotated within their pocket position by a central pinion 7 (Fig. 2) of which its hub is held fixed by stationary slotted bracket 8 (Fig. 3) attached to stationary manifold 3. Motion is imparted to the disks 5 by the rotation of wheel 1 driven by driver 9. Spray manifolds 2, 3 are stationary and positioned on the front and back side of etching wheel 1. Rotation of wheel 1 produces a "near" random planetary trace of disks 5 relative to manifolds 2, 3.