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Method to Characterize the Stability of a Step and Repeat Lithographic System

IP.com Disclosure Number: IPCOM000043915D
Original Publication Date: 1984-Oct-01
Included in the Prior Art Database: 2005-Feb-05

Publishing Venue

IBM

Related People

Authors:
Bureau, L Su, LS [+details]

Abstract

The first order overlay parameters of photorepeater array generation as a function of X, Y table position have been studied. The estimated parameters are found to fluctuate against either row or column position of the X, Y table. The fluctuations represent influences of higher order overlay parameters not included in the current overlay model; thus, they point out some precautions to be exercised in the estimation the first order overlay parameters. The experimental procedure used in this study offers a simple and useful way to study the photorepeater overlay characteristics using small dimensional measurement data and to make two-dimensional standard containing angular information. The overlay performance of a lithographic system has to be strictly controlled in order to manufacture high performance VLSI circuits.