ENHANCEMENT OF TERPOLYMER RESIST R/Ro THROUGH RESIST FILM SURFACE TREATMENT
Original Publication Date: 1984-Oct-01
Included in the Prior Art Database: 2005-Feb-05
This article describes a process whereby the R/Ro of a terpolymer photoresist film is raised significantly by treatment with a metal ion solution. This increase in R/Ro is accompanied by a widening of the dry etch process window and the prevention of interlayer penetration in multilayer resist processes. Trace metal ions in the developer solution have been determined to be a cause of varying Ro . Undesirably low R/Ro in the terpolymer resist system is normally offset by stabilizing the effect of the metal ions by obtaining their removal from the developer through the use of a chelating agent. By use of resist surface treatment, the resist film Ro is virtually independent of the original material Ro, thereby simplifying manufacture of the polymer.