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High Density Information Storage Substrate Disclosure Number: IPCOM000044115D
Original Publication Date: 1984-Nov-01
Included in the Prior Art Database: 2005-Feb-05

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Baxter, DW Gonnella, NT [+details]


This article describes an optical or magnetic disk substrate with servo information permanently etched into the substrate by means of semiconductor techniques. The substrate consists of a single crystal silicon wafer and a layer of silicon oxide with servo information permanently etched therein to form circular tracks. The process used for making the substrate comprises the following steps. 1. Start with the normal single crystal silicon wafer used in making semiconductors. 2. Apply an oxide film (1500 A thick) by either growing it or sputtering it on the surface. 3. Apply photoresist to the oxide surface. 4. Expose the photoresist with normal UV (ultraviolet) contact printing, electron beam proximity printing or a UV laser, such as an argon laser. 5. Develop the photoresist patterns by normal solvent techniques. 6.