General-Purpose Pattern Generator for E-Beam Lithography
Original Publication Date: 1984-Dec-01
Included in the Prior Art Database: 2005-Feb-05
In a computer-controlled pattern writing system of the type wherein a pattern to be written has been subdivided into elementary shapes and the elementary shapes are written in succession by a beam which is controlled by a pattern generator (i.e., a vector scan system), an improvement is described wherein the set of possible elementary shapes includes both rectangular coordinate system-defined elementary shapes and polar coordinate system-defined elementary shapes. The rectangular elementary shapes are written by the beam while the beam is under the control of a rectangular coordinate system pattern generator, and the polar elementary shapes are written by the same beam while it is under the control instead of a polar coordinate system pattern generator.