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Gas Phase, Laser- and Light-Induced Metal Deposition From Metal Substituted Fluorinated Compounds

IP.com Disclosure Number: IPCOM000044482D
Original Publication Date: 1984-Dec-01
Included in the Prior Art Database: 2005-Feb-06

Publishing Venue

IBM

Related People

Authors:
Baum, TH Houle, FA Jones, CR Kovac, CA [+details]

Abstract

A general class of inorganic and organometallic complexes, which have as at least one substituent a trifluoro- or hexafluoro-acetylacetonate (ACAC) group and one or more remainng substituents which may be ACAC groups or alkyl or aryl substituents as is necessary to satisfy the valence of the metal, undergo photothermal and/or photochemical decomposition to metal upon exposure to light or laser irradiation. (See formula below.) A large number of fluorinated metal ACAC complexes have adequate volatilities at room or moderate temperatures which make them excellent candidates for gas phase work[1,2]. Example of complexes that thermally or photochemically react to produce the corresponding metals are platinum and nickel. The gaseous complex can be used alone in a vacuum or with any of a variety of inert (e.g.