Browse Prior Art Database

Method for Uniformity Testing of Plasma Etching

IP.com Disclosure Number: IPCOM000044672D
Original Publication Date: 1984-Dec-01
Included in the Prior Art Database: 2005-Feb-06

Publishing Venue

IBM

Related People

Authors:
Lu, NH Wilson, JW [+details]

Abstract

A test vehicle is designed to measure etch rates at all locations within a reactor, without disturbing the real parts in the reactor, as well as to measure etch steps down to N 100 ˜. The test vehicle consists of a small (N 2 mm x 8 mm), flat piece of inert material, i.e., silicon wafer, which has been coated with a layer of the material to be etched. The layer of etchable material should be thin, but thick enough to prevent from being completely etched away during the test. This layer should also be uniform in thickness and have a smooth surface. The test vehicle is taped at an appropriate place in the etching reactor with several thin strips of aluminum tape. During the etching process, the material under the tape is not etched while the material next to the tape is etched.