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Browse Prior Art Database

Radiation Sensitive Compound

IP.com Disclosure Number: IPCOM000044842D
Original Publication Date: 1984-Nov-01
Included in the Prior Art Database: 2005-Feb-06

Publishing Venue

IBM

Related People

Authors:
Legg, RE Miller, RL Schwander, JD [+details]

Abstract

Certain organic nitriles form photosensitive complexes in the presence of certain alcohol, acids, esters or amines, and this property is used to provide a visible indication that a radiation sensitive compound, such as an adhesive or a potting compound, is cured.