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Deposition of Graded Oxides

IP.com Disclosure Number: IPCOM000044845D
Original Publication Date: 1984-Nov-01
Included in the Prior Art Database: 2005-Feb-06

Publishing Venue

IBM

Related People

Authors:
Kroll, CT [+details]

Abstract

An improved method for depositing graded band gap oxides is disclosed. The method uses the plasma enhanced CVD technique to produce the graded band oxide, wherein the deposition is carried out at relatively low temperatures, i.e., equal to or less than 350 degrees Centigrade.