Novel Multilayer Photoresist Structure for E-Beam Mask Making
Original Publication Date: 1983-Jan-01
Included in the Prior Art Database: 2005-Feb-06
A multilayer photoresist structure for E-beam mask making is described. Masks are made by employing a conventional photoresist layer on a typical chrome clad glass plate. The photoresist layer is, in turn, coated with a layer of E-beam sensitive resist.