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Novel Multilayer Photoresist Structure for E-Beam Mask Making

IP.com Disclosure Number: IPCOM000045084D
Original Publication Date: 1983-Jan-01
Included in the Prior Art Database: 2005-Feb-06

Publishing Venue

IBM

Related People

Authors:
Cook, FD Cook, JA Dosio, CP [+details]

Abstract

A multilayer photoresist structure for E-beam mask making is described. Masks are made by employing a conventional photoresist layer on a typical chrome clad glass plate. The photoresist layer is, in turn, coated with a layer of E-beam sensitive resist.