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Spatial Profile Measurement of Ion Flux

IP.com Disclosure Number: IPCOM000045153D
Original Publication Date: 1983-Feb-01
Included in the Prior Art Database: 2005-Feb-06

Publishing Venue

IBM

Related People

Authors:
Brosious, PR DeCain, DM Kleinsasser, AW [+details]

Abstract

Locating a Faraday cup probe directly on the substrate platform exposes the probe to the same ion flux to which wafers are exposed, and permits scanning of the probe repeatedly as the probe passes a scanning point, thus providing a dynamic monitor of the beam profile.