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Gas Panel Glow Site and Defect Enhancement by Citric Acid Etch Procedure

IP.com Disclosure Number: IPCOM000045277D
Original Publication Date: 1983-Feb-01
Included in the Prior Art Database: 2005-Feb-06

Publishing Venue

IBM

Related People

Authors:
Seehase, H [+details]

Abstract

In plasma panel fabrication, orthogonal conductor arrays are formed on a pair of glass plates and overcoated with a dielectric layer. The dielectric is susceptible to ion bombardment during operation such that a thin overcoat of magnesium oxide is E-beam evaporated over the dielectric surface. However, the thickness of the magnesium oxide (MgO) layer depends on the evaporant angle of incidence. On large size plasma panels, there are a number of MgO growth regions across large substrates which, if untreated, provide significant voltage degradation.