Gas Panel Glow Site and Defect Enhancement by Citric Acid Etch Procedure
Original Publication Date: 1983-Feb-01
Included in the Prior Art Database: 2005-Feb-06
In plasma panel fabrication, orthogonal conductor arrays are formed on a pair of glass plates and overcoated with a dielectric layer. The dielectric is susceptible to ion bombardment during operation such that a thin overcoat of magnesium oxide is E-beam evaporated over the dielectric surface. However, the thickness of the magnesium oxide (MgO) layer depends on the evaporant angle of incidence. On large size plasma panels, there are a number of MgO growth regions across large substrates which, if untreated, provide significant voltage degradation.