The following operators can be used to better focus your queries.
( ) , AND, OR, NOT, W/#
? single char wildcard, not at start
* multi char wildcard, not at start
(Cat? OR feline) AND NOT dog?
Cat? W/5 behavior
(Cat? OR feline) AND traits
Cat AND charact*
This guide provides a more detailed description of the syntax that is supported along with examples.
This search box also supports the look-up of an IP.com Digital Signature (also referred to as Fingerprint); enter the 72-, 48-, or 32-character code to retrieve details of the associated file or submission.
Concept Search - What can I type?
For a concept search, you can enter phrases, sentences, or full paragraphs in English. For example, copy and paste the abstract of a patent application or paragraphs from an article.
Concept search eliminates the need for complex Boolean syntax to inform retrieval. Our Semantic Gist engine uses advanced cognitive semantic analysis to extract the meaning of data. This reduces the chances of missing valuable information, that may result from traditional keyword searching.
This invention relates to circuitry fabricated on silicon or silicon like wafers of chips and is applicable to very large scale integrated (VLSI) circuits. It is also directly related to Josephson circuits.
English (United States)
This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately
53% of the total text.
Page 1 of 2
Epitaxial Double Sided Circuitry
This invention relates to circuitry fabricated on silicon or silicon like wafers of
chips and is applicable to very large scale integrated (VLSI) circuits. It is also
directly related to Josephson circuits.
Fine lines or nanostructures and other electron microscope applications have
recently made extensive use of window substrates, an example of which is
shown in Fig. 1. These window chips are fabricated by patterning the back of the
wafer, and many windows are fabricated at the same time; this is illustrated in
Fig. 2. The pattern of the windows can be regular or formed in almost any
desired pattern by controlling the masking and subsequent etching. In fact, the
detailed patterning of the back (or one side) of the wafer is an important part of
The prime embodiment of this invention is shown in Figs. 3 and 4. In Fig. 3,
we show a window configuration cut in a silicon wafer where in the membrane is
the top part of the silicon wafer. No additional material such as SiO(2) or
Si(3)N(4) has been deposited on the top surface. The etching which forms the
window can be stopped within a few monolayers of the surface, and Si windows
of up to several thousand angstroms thick are possible. By using the pure Si
surface (both top and bottom) as the substrate for fabricating subsequent
circuitry, a unique advantage is obtained; i.e., a single crystal surface is used as
the substrate for the subsequent circuitry. In this way, epitaxial growth of the
circuitry can be used to get, for example, single crystal or large grain polycrystal
metal lines. Improved and controlled...