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Process for Controlled Thin Film Chemical Compound Formation at and Removal from Solid Surfaces

IP.com Disclosure Number: IPCOM000045536D
Original Publication Date: 1983-Apr-01
Included in the Prior Art Database: 2005-Feb-07

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Avouris, P Marks, RF Pollak, RA Thefaine, YJ [+details]


It is desirable to be able to fabricate ultra-thin films of controlled thickness for many applications including microelectronics, Josephson junctions, field-effect transistors and hot electron devices such as metal-based transistors.