Characterization of Photolithographic Tooling by use of an X-Y Coordinate System
Original Publication Date: 1983-Apr-01
Included in the Prior Art Database: 2005-Feb-07
DISCUSSION. Today the standard technique for characterizing a photo tool utilizes the conventional mask/wafer contact set, the assumption being that the wafers are true one-to-one reproductions of the mask. In most cases this assumption is valid, but only to the accuracy that wafers can be measured using the standard vernier-type structure.