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Process for Making Photoresist Microbridges

IP.com Disclosure Number: IPCOM000045783D
Original Publication Date: 1983-Apr-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Gillespie, SJ [+details]

Abstract

A simple process for making photoresist microbridges includes the steps of exposing with a beam a first set of lines on a layer of photoresist in a given direction and then exposing with the beam at a lower dose a second line or set of lines on the layer of photoresist in a direction which intersects the first lines. Development is then done for an undercut profile of the photoresist located between the exposure lines of first set. A microbridge, which is particularly useful in the Josephson technology, is formed where the second line or set of lines intersects photoresist islands defined by the first set of lines.