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Precision Patterning for Laser Micromachining

IP.com Disclosure Number: IPCOM000045944D
Original Publication Date: 1983-May-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Hodgson, RT Moskowitz, PA Vigliotti, DR von Gutfeld, RJ [+details]

Abstract

Laser-enhanced etching is a useful technique for etching metals, ceramics, and plastics. It uses an etchant solution in combination with a laser beam, the etchant having its greatest effect in the area struck by the laser beam. In order to eliminate the need for precisely steering the laser beam, a reflective masking layer can be used on the surface to be etched. The masking layer must be a highly reflective patterned surface layer that resists the etchant. It is deposited and patterned in the usual manner by resist techniques, using either etching or lift-off.