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Water Developable Photo/Electron Resist

IP.com Disclosure Number: IPCOM000046036D
Original Publication Date: 1983-May-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
LaBar, RA [+details]

Abstract

Positive resists used in the lithographic processes in the manufacturing of microcircuits are developed by the use of organic solvents or alkaline solutions. The choice of developer depends on the chemical change which occurs upon exposure of the resist. Shipley's AZ-l350 is typical of a photoresist which is alkali developable. With appropriate solvents, the exposed portion of the resist is rendered alkaline soluble by conversion of the inhibitor (photoactive compound) to an alkaline soluble moiety. The chemistry and mechanism of systems of this type are well known to those skilled in the art.