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Preventing Formation of Polysilicon Rails

IP.com Disclosure Number: IPCOM000046046D
Original Publication Date: 1983-May-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Jambotkar, CG [+details]

Abstract

A method is described for preventing residues, or "rails", of polysilicon which often get left behind on wafers after patterns have been formed in a polysilicon layer using reactive ion etching (RIE).