Browse Prior Art Database

OPTICAL MEASURING SYSTEM TO 7500X MAGNIFICATION (0.l MICRON)

IP.com Disclosure Number: IPCOM000046054D
Original Publication Date: 1983-May-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Knapp, DG Masterson, FH Mueller, A O'Neill, BC [+details]

Abstract

This article concerns apparatus and method for quickly detecting and measuring sub-micron deflection of X-Y mask positioning in an electron-beam lithography system. The structure and steps measure physical decline using optical and video means.