Browse Prior Art Database

DETECTION OF SiO2 CRACKS WITH CAPACITANCE MEASUREMENTS

IP.com Disclosure Number: IPCOM000046404D
Original Publication Date: 1983-Jul-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Hopper, GS Rich, DW Roush, WB [+details]

Abstract

Quartz defects between levels of metallization can be detected via capacitance measurements. When quartz is sputtered over a metal layer, processing conditions occasionally stress the SiO2 and cause it to crack. These micro-cracks expose aluminum from the metal underlayer and cause the formation of Al2O3 (aluminum oxide).