DETECTION OF SiO2 CRACKS WITH CAPACITANCE MEASUREMENTS
Original Publication Date: 1983-Jul-01
Included in the Prior Art Database: 2005-Feb-07
Quartz defects between levels of metallization can be detected via capacitance measurements. When quartz is sputtered over a metal layer, processing conditions occasionally stress the SiO2 and cause it to crack. These micro-cracks expose aluminum from the metal underlayer and cause the formation of Al2O3 (aluminum oxide).