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Control of Resist-Hardening Process in a Barrel Plasma Etcher System

IP.com Disclosure Number: IPCOM000046414D
Original Publication Date: 1983-Jul-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Martinet, F [+details]

Abstract

One of the major problems recognized today with barrel plasma etcher reactors is the run to run reproducibility during the resist-hardening process. The process may be significantly improved by: 1) Aluminum Faraday cage DC bias voltage and 2) Monitoring and controlling the UV emission spectroscopy.