Browse Prior Art Database

EB Proximity Printer With Increased Throughput

IP.com Disclosure Number: IPCOM000046431D
Original Publication Date: 1983-Jul-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Asch, K Behringer, U Bohlen, H Keyser, J Kulcke, W Nehmiz, P [+details]

Abstract

An electron beam (EB) lithographic system for proximity printing uses complementary masks on which island-like structures are supported by thin grids differently positioned in the two masks, thus requiring only half the exposure time of conventional complementary masks.