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EB Proximity Printer With Increased Throughput Disclosure Number: IPCOM000046431D
Original Publication Date: 1983-Jul-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue


Related People

Asch, K Behringer, U Bohlen, H Keyser, J Kulcke, W Nehmiz, P [+details]


An electron beam (EB) lithographic system for proximity printing uses complementary masks on which island-like structures are supported by thin grids differently positioned in the two masks, thus requiring only half the exposure time of conventional complementary masks.