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Control of the Uniformity of Thin Films Formed by an RF Plasma

IP.com Disclosure Number: IPCOM000046519D
Original Publication Date: 1983-Jul-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue


Related People

Broom, RF Graf, V Heuberger, W [+details]


The uniformity of thin films formed by RF plasmas depends directly on the uniformity of the plasma itself. In the case of planar structures, only the uniformity of the density and energy of the reactive particles are important. In addition, for nonplanar structures like edge devices the uniformity in the incident angles of the reactive species also influences the uniformity of the films. For example, in edge junction technology for cryogenic circuits, variations of the Josephson current density across chip and wafer are substantially larger than those observed in planar technology. This effect is very pronounced when junctions of different orientation (left and right) are on the same chip.