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Browse Prior Art Database

Sputtering Target Rework Process

IP.com Disclosure Number: IPCOM000046604D
Original Publication Date: 1983-Aug-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Cistola, AB [+details]

Abstract

During a sputtering process, e.g., a cermet sputtering process, the sputtering target is monitored by an acoustic emission (AE) monitoring system and, if it detects a void in the target material, i.e., the cermet, from which undesirable gas contaminants are released, in-process corrective action can be initiated that accelerates the release of the gas, thereby maintaining the utility of the target which otherwise may have had to be scrapped. The system correlates the information to be analyzed from two known AE sensor monitors, in which one detects the cracks and the other detects the rate of sputtering. It monitors and analyzes for sputtering target cracks and the resultant outgas therefrom and, when a crack is detected, continues monitoring the sputtering rate for verification that the corrective action was effective.