Improved Monitor for Surface Analysis
Original Publication Date: 1983-Aug-01
Included in the Prior Art Database: 2005-Feb-07
The modulation of a monitor beam, operating in synchronism with a scanning analyzing beam, is enhanced for signal levels above a given threshold. Surface analysis methods using a scanning beam, such as secondary electron microscopy (SEM), secondary ion mass spectroscopy (SIMS), Auger analysis, etc., are often coupled to a monitor whose writing beam, scanned in synchronism with the analyzing beam, is modulated according to the detector signal of the analyzing apparatus. Such systems may be used to display the element distribution on the surface when the apparatus is tuned to the wavelengths or energies characteristic of a particular element. In these monitor systems, small changes of the output signal, such as a small local increase in element concentration, are difficult to detect by visual means.