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Browse Prior Art Database

Five-Degrees-Of-Freedom Stage for a Scanning Electron-Beam Microscope

IP.com Disclosure Number: IPCOM000046670D
Original Publication Date: 1983-Aug-01
Included in the Prior Art Database: 2005-Feb-07

Publishing Venue

IBM

Related People

Authors:
Via, G [+details]

Abstract

A five-degrees-of-freedom stage mechanism is shown in the above diagram. The objective of the stage is to enable the placement of a semiconductor wafer into a variety of orientations beneath the point of incidence of a scanning electron beam within a scanning electron-beam microscope chamber. The base 2 can be part of the wall of the electron-beam chamber and may in particular be a part of the access door into the chamber. Mounted on the inner surface of the base 2 is the X rotating table 4 which enables the first degree of motion, which is rotary motion, about the X-axis 5 which is stationary with respect to the base 2. Mounted onto the rotary table 4 is the Z-axis linear slide 6 which enables linear motion in the Z axis which is orthogonal to the X-axis.