In Situ Beam and Software Analysis
Original Publication Date: 1983-Dec-01
Included in the Prior Art Database: 2005-Feb-07
This article describes a technique for performing an in-line non-destructive evaluation of the pattern writing of an E-beam lithography system. Evaluation of an E-beam system and its software can be performed by analyzing the output rectangles of the E-beam system. Such an analysis can be done non-destructively by using a double layer resist combination wherein the two resists are selected to have a difference in sensitivity with the lower layer having a higher sensitivity. A pattern can be exposed so that the image of each spot is "burned" into the higher sensitivity resist in a way that it can be clearly visible under an optical microscope. Subfield and rectangle boundaries as well as spot count can be determined in large exposure areas.