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Material for Ablative Photo Decomposition

IP.com Disclosure Number: IPCOM000047916D
Original Publication Date: 1983-Dec-01
Included in the Prior Art Database: 2005-Feb-08

Publishing Venue

IBM

Related People

Authors:
Brock, PJ Dawson, DJ Jones, CR [+details]

Abstract

Ablative photo decomposition (APD) provides an attractive entry into dry, imagewise processing (without resists) of organic thin films. One essential aspect of multilevel processing is selective etching, whereby some materials act as etch barriers and etch stops, while others are readily etched. At the same time, these materials must be able to perform permanently and functionally in the structure. We have found that one such system, poly(triethynylbenzene) (PTEB), which is an all carbon-hydrogen aromatic and acetylenic polymer, does not etch at 27 mj/cm2/pulse, whereas acetylene thermoset prepolymer (ATP), a similar aromatic and acetylenic system containing an ether linkage, does etch. These systems provide the functional performance as thin film dielectrics, yet selective ether properties that permit selective processing.