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Cleaning of Metal Surfaces by Ion Etching

IP.com Disclosure Number: IPCOM000048074D
Original Publication Date: 1981-Dec-01
Included in the Prior Art Database: 2005-Feb-08

Publishing Venue

IBM

Related People

Authors:
Wood, JC [+details]

Abstract

Cleaning of a metal surface without damage to the surface topography is effected by ion bombardment in vacuo. The ion beam is caused to impact the target area, which is exposed through a mask, and the current to the target is monitored by means of a conductive shim surrounding the target.