Cleaning of Metal Surfaces by Ion Etching
Original Publication Date: 1981-Dec-01
Included in the Prior Art Database: 2005-Feb-08
Cleaning of a metal surface without damage to the surface topography is effected by ion bombardment in vacuo. The ion beam is caused to impact the target area, which is exposed through a mask, and the current to the target is monitored by means of a conductive shim surrounding the target.