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Diglyme/ Cyclohexanone Casting Solvent for Resists

IP.com Disclosure Number: IPCOM000048346D
Original Publication Date: 1982-Jan-01
Included in the Prior Art Database: 2005-Feb-08

Publishing Venue

IBM

Related People

Authors:
Hayden, TH Hummel, JP [+details]

Abstract

This resist enhances the dewet characteristics of the resist, increases the solubility of the photoactive compound (PAC), and reduces the amount of total solids in the resist solution.