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Gas Mixture For Materials Processing

IP.com Disclosure Number: IPCOM000048453D
Original Publication Date: 1982-Feb-01
Included in the Prior Art Database: 2005-Feb-08

Publishing Venue

IBM

Related People

Authors:
Angst, K Scheel, HJ [+details]

Abstract

Chemistry, particularly metallurgy of compounds, crystals, layers and devices of a metallic or semiconducting nature, frequently requires a rigorous minimization of the partial pressures of such gases which would react at the synthesis temperature with other components to form undesired compounds. Oxygen (also H(2)O and other gases like CO(2), or v apors which could be reduced and thus result in an oxygen partial pressure) is such a reactive gas which is difficult to remove owing to its widespread occurrence. Other examples are nitrogen, leading to nitrides, and carbon-containing gases and vapors, leading to carbides.