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Photoresist Linewidth Measurement Technique

IP.com Disclosure Number: IPCOM000048547D
Original Publication Date: 1982-Feb-01
Included in the Prior Art Database: 2005-Feb-08

Publishing Venue

IBM

Related People

Authors:
Moritz, H [+details]

Abstract

A technique is provided for measuring line widths of a substantially regular pattern of a first material having a surface with a first reflectance disposed on a second material having a surface with a second reflectance different from that of the first reflectance.