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Use of Marks Formed In Resist To Verify E-Beam To Optical Mark Placement Disclosure Number: IPCOM000048599D
Original Publication Date: 1982-Feb-01
Included in the Prior Art Database: 2005-Feb-08

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Bentley, WJ Galie, JR Helmeyer, GA Horvat, JG Peressini, PP [+details]


This proposal allows wafers to be reworked if not within the E-beam exposure tool capture range.