Browse Prior Art Database

Use of Marks Formed In Resist To Verify E-Beam To Optical Mark Placement

IP.com Disclosure Number: IPCOM000048599D
Original Publication Date: 1982-Feb-01
Included in the Prior Art Database: 2005-Feb-08

Publishing Venue

IBM

Related People

Authors:
Bentley, WJ Galie, JR Helmeyer, GA Horvat, JG Peressini, PP [+details]

Abstract

This proposal allows wafers to be reworked if not within the E-beam exposure tool capture range.