Browse Prior Art Database

High Resolution Electron Beam Monomolecular Resist Materials Containing Sites of Unsaturation

IP.com Disclosure Number: IPCOM000048763D
Original Publication Date: 1982-Mar-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Brown, C Czornyj, G Kellner, B Wu, A [+details]

Abstract

The use of monomolecular resists for E-beam microlithography has been described by Barraud, Rosilio and Ruaudel-Teixier in France (e.g., Solid State Technology 22 (8), 120-124 (1979), in their article "Monomolecular Resists: A new Class of High Resolution Resists for Electron Beam Microlithography").