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Technique To Improve Subfield Registration

IP.com Disclosure Number: IPCOM000048785D
Original Publication Date: 1982-Mar-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Davis, DE Weber, EV [+details]

Abstract

An arrangement is described for compensating for backscatter current variation, due mainly to plate-to-plate variations in material thickness, in E-beam mask inspection tools.