Multi-Reticle Alignment Apparatus For Wafers
Original Publication Date: 1982-Mar-01
Included in the Prior Art Database: 2005-Feb-09
An improved test apparatus for comparing varying masterslice wafers against their matched reticles by employing a television superposition system, wherein one TV camera, through microscopic optics, images the wafer and a second TV camera images the corresponding reticle selected from a plurality of reticles mounted on a manually indexable wheel which is rotated until the desired reticle is moved into view of the optical system and displayed on the TV monitor. Up to eight reticles are mounted on the wheel to permit ready access by the operator.