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Process for Simultaneously Making Thin and Thick Epitaxial Layers Disclosure Number: IPCOM000048919D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09

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Howard, DD [+details]


A process is provided for simultaneously producing on a common substrate a thin epitaxial layer on a first portion of the surface of the substrate and a thick epitaxial layer on a second portion of the surface of the substrate for forming low voltage devices and high voltage devices, respectively, on the common substrate.