Browse Prior Art Database

Process for Simultaneously Making Thin and Thick Epitaxial Layers

IP.com Disclosure Number: IPCOM000048919D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Howard, DD [+details]

Abstract

A process is provided for simultaneously producing on a common substrate a thin epitaxial layer on a first portion of the surface of the substrate and a thick epitaxial layer on a second portion of the surface of the substrate for forming low voltage devices and high voltage devices, respectively, on the common substrate.