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Low High Polysilicon Process for Smooth Films

IP.com Disclosure Number: IPCOM000048958D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Gardiner, JR Makarewicz, SR Pliskin, WA [+details]

Abstract

This process provides smooth polysilicon film with improved breakdown characteristics of oxides grown on polysilicon.