Removal of Rie Induced Si(3)N(4) Ribbons
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09
Anisotropic etching (reactive ion etching) used in achieving better resolution and tolerances of photoresist geometry does not etch an RIE induced coating from the sidewalls of a particular topology. The combination of anisotropic and isotropic etching resolves this problem without impact on resolution and tolerances.