Browse Prior Art Database

Removal of Rie Induced Si(3)N(4) Ribbons

IP.com Disclosure Number: IPCOM000048962D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Marinaccio, FA Rozich, WR Waite, TW [+details]

Abstract

Anisotropic etching (reactive ion etching) used in achieving better resolution and tolerances of photoresist geometry does not etch an RIE induced coating from the sidewalls of a particular topology. The combination of anisotropic and isotropic etching resolves this problem without impact on resolution and tolerances.