Standard Wafer for Intensity And Focus Testing
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09
This article describes a method and apparatus for standardizing tools which use scattered light to detect contamination and flaws on the surface of semiconductor wafers. Described is a standardizing method which features comparison and equalization of the scattered light pattern produced by an array of scattering centers on a specially prepared test wafer successively mounted in the tools between which standardization is desired.