Self Aligned GaAs MESFET Structure
Original Publication Date: 1982-May-01
Included in the Prior Art Database: 2005-Feb-09
Self-aligned GaAs metal semiconductor field-effect transistor (MESFET) structures in which the source and drain contacts are used to align a later deposited gate are generally limited by edge resolution of the alloyed source and drain contacts. A process that will yield smaller gate lengths employing gate formation through a hole in a metallized region is set forth in connection with Figs. 1 to 4.