Highly Sensitive Positive Resist Systems for Lithographic Applications
Original Publication Date: 1982-May-01
Included in the Prior Art Database: 2005-Feb-09
Described is the synthesis and lithographic application of new resist materials for E-beam, optical and X-ray lithography. It is known in the art of lithography that, in general, the incorporation of atoms with larger cross section enhances electron capture efficiency and also X-ray sensitivity.