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Highly Sensitive Positive Resist Systems for Lithographic Applications

IP.com Disclosure Number: IPCOM000049142D
Original Publication Date: 1982-May-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Kwong, RW Sachdev, HS Sachdev, K [+details]

Abstract

Described is the synthesis and lithographic application of new resist materials for E-beam, optical and X-ray lithography. It is known in the art of lithography that, in general, the incorporation of atoms with larger cross section enhances electron capture efficiency and also X-ray sensitivity.