Browse Prior Art Database

Use of HCL at Base Oxidation

IP.com Disclosure Number: IPCOM000049147D
Original Publication Date: 1982-May-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Cooper, SA Davey, PM Johnson, RD [+details]

Abstract

This article relates to the use of HCL gas at base oxidation to better control RS valves, oxide thickness, mobile charge level, and effects on transistor leakage.