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Use of HCL at Base Oxidation Disclosure Number: IPCOM000049147D
Original Publication Date: 1982-May-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue


Related People

Cooper, SA Davey, PM Johnson, RD [+details]


This article relates to the use of HCL gas at base oxidation to better control RS valves, oxide thickness, mobile charge level, and effects on transistor leakage.