Ultra-Soft X-Ray Lithography
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09
We propose to use a membrane fabricated from a material which has a passband in the range of about 100 Angstroms to 400 Angstroms, such as silicon, aluminum or magnesium, as a supporting substrate for an X-ray mask. There are very attractive X-ray sources and existing resists sensitive in the 100 Angstroms to 400 Angstroms range, so that 0.1 Mum scale lithography could be advantageously implemented with such a mask.