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Ultra-Soft X-Ray Lithography

IP.com Disclosure Number: IPCOM000049241D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Coleman, G McCorkle, RA [+details]

Abstract

We propose to use a membrane fabricated from a material which has a passband in the range of about 100 Angstroms to 400 Angstroms, such as silicon, aluminum or magnesium, as a supporting substrate for an X-ray mask. There are very attractive X-ray sources and existing resists sensitive in the 100 Angstroms to 400 Angstroms range, so that 0.1 Mum scale lithography could be advantageously implemented with such a mask.