Browse Prior Art Database

Improved Photoresist Structure for Lift Off Techniques

IP.com Disclosure Number: IPCOM000049336D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Nadeau, DP [+details]

Abstract

This process results in a more clearly defined metallurgy stripe deposited by lift-off techniques.