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Method of Cleaning Shadow Masks for Corpuscular Ray Lithography

IP.com Disclosure Number: IPCOM000049374D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Bohlen, H Greschner, J Kulcke, W Nehmiz, P [+details]

Abstract

Being arranged in a vacuum, masks for corpuscular ray lithography cannot be blown clean. Instead, the contamination particles, without being removed from the mask, are either rendered ineffective by being covered with a conductive metal layer or are removed from the mask by a second cleaning technique, using electrostatic measures.