Method of Cleaning Shadow Masks for Corpuscular Ray Lithography
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09
Being arranged in a vacuum, masks for corpuscular ray lithography cannot be blown clean. Instead, the contamination particles, without being removed from the mask, are either rendered ineffective by being covered with a conductive metal layer or are removed from the mask by a second cleaning technique, using electrostatic measures.