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Detection of Oxygen Contamination in a Plasma Process

IP.com Disclosure Number: IPCOM000049609D
Original Publication Date: 1982-Jun-01
Included in the Prior Art Database: 2005-Feb-09

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Beam, DL [+details]


Briefly, this article describes a method for detecting oxygen contamination in a plasma process. The plateability of a thin metallic film serves as a test for the presence of oxygen in a plasma.