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Method of Exposing Semiconductor Wafers by Electron Beam Proximity Printing

IP.com Disclosure Number: IPCOM000049725D
Original Publication Date: 1982-Jul-01
Included in the Prior Art Database: 2005-Feb-09

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Bohlen, H Greschner, J Keyser, J Nehmiz, P [+details]


This article describes a method of exposing semiconductor wafers by electron beam proximity printing and in particular the problem of minimizing image distortions in proximity printing with electron or ion beams.