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Enhanced Plasma Stripping of Photoresist

IP.com Disclosure Number: IPCOM000049736D
Original Publication Date: 1982-Jul-01
Included in the Prior Art Database: 2005-Feb-09

Publishing Venue

IBM

Related People

Authors:
Gardner, T Suskie, M [+details]

Abstract

One of the steps in gas panel fabrication is to define the conductor configuration of the plates by a photoresist process followed by a chrome copper chrome conductor deposition. During the wet processing of gas panel plates which includes a positive photoresist process, the chrome films comprising the upper layer of the conductors are etched in a potassium permanganate solution whereby the surface of the photoresist becomes contaminated with a decomposition product of potassium permanganate, i.e., manganese dioxide. The manganese dioxide was found to act as a very effective stripping inhibitor.